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Anti-reflection conductive film continuous magnetron sputtering production line
Product brief introduction
It's designed with 15 vacuum chamber. It includes one inlet chamber, one outlet chamber, one inlet buffer chamber,one outlet buffer chamber, one inlet transfer chamber, one outlet transfer chamber and two transfer chambers; seven sputtering chamber, each

Anti-reflection conductive film continuous magnetron sputtering production line has obtained software copyrights and two patents for equipment control system. It's designed with 15 vacuum chamber. It includes one inlet chamber, one outlet chamber, one inlet buffer chamber,one outlet buffer chamber, one inlet transfer chamber, one outlet transfer chamber and two transfer chambers; seven sputtering chamber, each sputtering chamber installed with four cathode. High vacuum chamber adopts flapper valve isolation.By changing the gas isolation can achieve multifunctional coating. Substrate holder orbit using magnetic guide transmission. Machine equipped with 26 sets turbo molecular pumps, 13 sets mechincal pumps to achieve stable pumping speed and uniform gas distribution.

Increase the transmittance of the backlight, reduce the reflection of external light; get high color contrast and color appearance. Widely used in LCD monitors, LCD TV, MP4, car shows , phone displays, digital cameras and laptop.

1.Ultimate vacuum:7x10-4Pa.                    

2.Production cycle40~120 S/frame

3.Basic frame size:859*1500mm (can be customized) 

4.Film uniformity:±2%

5.Film stability:up to international standards

Widely used in LCD monitors, LCD TV, MP4, car shows , phone displays, digital cameras and laptop. 

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