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Excitation energy to ensure the coatings with high density plasma, the high power pulsed magnetron sputtering (HIPIMS)power can help you obtain good coating results.

• The obtained film has excellent performance in terms of homogeneity, hardness, abrasion resistance and viscosity
• Can be used as an alternative to DC magnetron sputtering power supply, the use of existing magnetron sputtering system, without the need for equipment modification
• Multiple ionization and ion directed so that it can be used for channel filling and other processes

Features：
• Power up to 8 MW
• Arc reaction sensitivity
• Pulse duration and frequency setting
• Real time control and monitoring pulse
• Back interface

Customer benifit：
• High flexibility, applicable to a variety of scientific research and industrial processes
• Magnetron sputtering without droplets, minimal surface damage
• Convenient to match with existing cathode system and process condition
• Make full use of the target
• Best device connection settings