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The device using pulsed laser deposition (PLD) thin film deposition techniques, by means of pulsed laser rapid evaporation of the target, the generation and target composition film of the same. Through the continuous melting of mixed target, the production of multilayer film with different materials, through the control of the number of pulses, you can precisely adjust the film thickness to a single atomic layer. PLD method can gain possession of the steady state of the composition and structure of synthetic material criterions of thermodynamic theory, the manufacture of ceramic oxide and nitride films, metal multilayers and a variety of super lattice(superlattices).

Thin film growth principle:

PLD is a laser pulse through the synthetic quartz window into the vacuum chamber radiation, then into the target membrane, the target, after irradiating, absorbed high density energy and formation of plume like plasma state, are then formed films on its opposite substrate.

Features：

• A laser beam can be used for a plurality of vacuum systems, and the cost is saved;
• About 10 to 15 minutes, can grow high quality samples, to achieve high efficiency coating;
• As a "digital" technology, process control (A/pulse) can be carried out on the nanometer scale;
• The deposited film retains the stoichiometric composition of the target, and the film is composed of the same chemical composition as the target;
• By controlling the coating pressure and temperature, a series of nano structure and nano particles with unique function can be synthesized;
• Energy source (pulsed laser) is located outside the vacuum chamber, in the synthesis of the material, the dynamic range of the working pressure is very wide, reaching Torr 10-10 ~ 100 Torr.