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PACVD hard coating system to provide complete sets of off-shelf operation, a set of standard formulation, allowing standard sedimentation based on diamond like carbon coating (DLC), pure a-C: H deposition not to sandwich depending on the application of chemical and mechanical requirements, single or multilayer deposition and carbon based top, in the DLC coatings are deposited after the selection of the substrate, including a variety of steel carbide, light metal, ceramic, plastic and other materials.

PACVD hard coating system features：
►  2 plasma excitation sources (RF, DC / DC pulse);
►  Installed 2 closed field unbalanced magnetron sputtering on both sides;
►  With a front door of the hexagonal vacuum chamber, to ensure a clean environment;
►  Dry vacuum systems are designed to install in a separate space, handling high throughput of hydrocarbons and other processing gases;
►  Substrate, conductive and non-conductive coating and ion excitation system with high efficiency in situ cleaning;
►  The plasma excitation, its mode and frequency can be selected to adapt the plasma density and energy to the substrate, and be ionized with minimum pressure;
►  The shutters reduce magnetron targets being poisoned in PACVD process;
►  single PACVD process is not forced to rotate, a planetary rotation is also uniformly capable depositing on a sputter coating;
►  Especially in the PACVD process, the special design of air intake system can optimize the coating uniformity and cleanliness;
►  The selection of the pump and the upper and lower steam pressure regulation, to ensure the high reliability of the coating system;
►  IFIX based control system, easy batch, recipe and alarm processing;
►  All data acquisition, to ensure the best process control, making the best inspection plan in the process. In the batch operation, the operator can also copy the changes or new processes;
►  The user can set the access control system to ensure quality and safety of the system.

Target material: Ti, Cr, (Zr) single plates

Coating: a-C:H, a-Si:C:H

Nitrides: TiN, Cr, ZrN, Carbon nitride(TiCrN,CrCN), Combinations of Nitrides, 
          Carbo-nitrides and DLC

Available plasma area: PACVD: Ø 900 × H 700 mm
                  PVD/PACVD: Ø 600 × 500mm

Gases: Ar, H2, N2, C2H2, Si-Precursor

Loading: 200 kg