Optical film equipment can be prepared in a variety of optical coatings have occurred, such as conductive films, solar cells, antireflection film , used in electronic , digital , solar, glass , decoration and other industries.
Continuous Magnetron Sputtering Coating Equipment is mianly used in flat glass, acrylic, PC, PE materials to get a high quality, multi-function metal film, electromagnetic shielding film, reaction film, transparent conductive film, antireflection (AR)&enh
Specifically designed for the production of few layer but large-capacity, high-efficiency optical film products. This series coating machine is suitable for glass and plastic optical lenses, eyeglasses AF, AS film coating production, also for the phone wi
The device is merged into a vacuum for digital photoelectric window lens and shell material processing, which is aimed at current industrial solutions for the phone screen window cover, lens window lens, shell and metal parts of the vacuum coating perform
This machine can achieve a good reproducibility and stable manufacture of high quality optical wavelength film, including the decorative film comprises a functional film , nitride film, applied in LED, optical oscilloscope, electronic components, digital
Computer automatic control, interface design simple operation, high reproducibility coating, equip with crystal sensor thickness meter, automatic evaporation deposition system, input parameters, process control and data storage capabilities, strengthen pr
This production line uses RF ion CVD technology. It has fast deposition rate, good film quality features. It can coat large size plain oxide film, nitride film, oxynitride film, a silicon film and amorphous silicon carbide film.
This production line for capacitive touch screen. It designed with 15 vacuum chamber. It includes one inlet chamber, one outlet chamber, one inlet buffer chamber,one outlet buffer chamber, one inlet transfer chamber, one outlet transfer chamber and two tr
It's designed with 15 vacuum chamber. It includes one inlet chamber, one outlet chamber, one inlet buffer chamber,one outlet buffer chamber, one inlet transfer chamber, one outlet transfer chamber and two transfer chambers; seven sputtering chamber, each
